Open AccessShape positional accuracy optimization via writing order correction
Author(s) -
Gerald G Lopez,
Steven Wood,
Meredith Metzler,
Stefan J. H. Stammberger,
Roger McCay
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4963149
Subject(s) - optics , electron beam lithography , lithography , raster scan , beam (structure) , raster graphics , materials science , physics , resist , computer science , nanotechnology , artificial intelligence , layer (electronics)