z-logo
open-access-imgOpen Access
Nanoscale Schottky barrier mapping of thermally evaporated and sputter deposited W/Si(001) diodes using ballistic electron emission microscopy
Author(s) -
Westly Nolting,
Chris Durcan,
Avyaya J. Narasimham,
V. P. LaBella
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4958721
Subject(s) - schottky barrier , materials science , sputtering , silicon , sputter deposition , schottky diode , optoelectronics , tungsten , transmission electron microscopy , optics , diode , thin film , nanotechnology , physics , metallurgy

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom