Open AccessSub-30 keV patterning of HafSOx resist: Effects of voltage on resolution, contrast, and sensitivity
Author(s) -
Kurtis C. Fairley,
Meredith C. Sharps,
Gavin Mitchson,
Jeffrey Ditto,
Darren W. Johnson,
David C. Johnson
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4954394
Subject(s) - resist , materials science , resolution (logic) , electron beam lithography , optics , cathode ray , monte carlo method , beam (structure) , acceleration voltage , optoelectronics , sensitivity (control systems) , surface roughness , electron , nanotechnology , physics , statistics , mathematics , engineering , layer (electronics) , quantum mechanics , artificial intelligence , electronic engineering , computer science , composite material