Open AccessTilted ion implantation as a cost-efficient sublithographic patterning technique
Author(s) -
Sang Wan Kim,
Peng Zheng,
Kimihiko Kato,
L. Rubin,
TsuJae King Liu
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4953085
Subject(s) - masking (illustration) , hydrofluoric acid , materials science , ion implantation , wafer , layer (electronics) , silicon , substrate (aquarium) , optoelectronics , tilt (camera) , ion , silicon dioxide , nanotechnology , composite material , chemistry , metallurgy , mechanical engineering , art , oceanography , organic chemistry , geology , engineering , visual arts