Open AccessHe plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
Author(s) -
Dominik Metzler,
F. Weilnboeck,
Sebastian Engelmann,
Robert L. Bruce,
G. S. Oehrlein
Publication year - 2016
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4949274
Subject(s) - resist , photoresist , etching (microfabrication) , materials science , masking (illustration) , adamantane , plasma , plasma etching , ultraviolet , outgassing , analytical chemistry (journal) , surface roughness , optoelectronics , nanotechnology , chemistry , composite material , layer (electronics) , organic chemistry , art , physics , quantum mechanics , visual arts