z-logo
open-access-imgOpen Access
In situ monitoring of hydrogen desorption from silicon nanoparticles dispersed in a nonthermal plasma
Author(s) -
Thomas Lopez,
Lorenzo Mangolini
Publication year - 2016
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4946839
Subject(s) - materials science , silicon , hydrogen , silane , nanoparticle , analytical chemistry (journal) , plasma , argon , fourier transform infrared spectroscopy , plasma cleaning , absorption (acoustics) , infrared spectroscopy , chemical engineering , nanotechnology , atomic physics , optoelectronics , chemistry , composite material , organic chemistry , chromatography , quantum mechanics , physics , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom