Open AccessNative oxide transport and removal during the atomic layer deposition of Ta2O5 on InAs(100) surfaces
Author(s) -
Alex J. Henegar,
Theodosia Gougousi
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4945115
Subject(s) - x ray photoelectron spectroscopy , atomic layer deposition , oxide , indium , arsenic , materials science , layer (electronics) , inorganic chemistry , deposition (geology) , sputtering , tantalum , analytical chemistry (journal) , chemical engineering , chemistry , thin film , nanotechnology , metallurgy , environmental chemistry , paleontology , sediment , engineering , biology
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