Open AccessRu nucleation and thin film smoothness improvement with ammonia during chemical vapor deposition
Author(s) -
Wen Liao,
John G. Ekerdt
Publication year - 2016
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4944852
Subject(s) - nucleation , partial pressure , ammonia , x ray photoelectron spectroscopy , chemical vapor deposition , scanning electron microscope , thin film , analytical chemistry (journal) , torr , materials science , chemistry , chemical engineering , nanotechnology , composite material , thermodynamics , oxygen , organic chemistry , physics , engineering