Open AccessApplication of cyclic fluorocarbon/argon discharges to device patterning
Author(s) -
Dominik Metzler,
Kishore Uppireddi,
Robert L. Bruce,
Hiroyuki Miyazoe,
Yu Zhu,
William S. Price,
Ed S. Sikorski,
Chen Li,
Sebastian Engelmann,
Eric Joseph,
G. S. Oehrlein
Publication year - 2015
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4935460
Subject(s) - fluorocarbon , etching (microfabrication) , materials science , resist , argon , substrate (aquarium) , optoelectronics , plasma etching , layer (electronics) , oxide , reactive ion etching , silicon , nanotechnology , plasma , chemistry , composite material , metallurgy , organic chemistry , oceanography , physics , quantum mechanics , geology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom