Open AccessThermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS
Author(s) -
Yunxi Yao,
Francisco Zaera
Publication year - 2015
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4927843
Subject(s) - x ray photoelectron spectroscopy , silanol , chemistry , oxidation state , copper , silicon , inorganic chemistry , oxide , thermal decomposition , metal , catalysis , chemical engineering , organic chemistry , engineering