Open AccessMolecular beam epitaxy growth of SnO2 using a tin chemical precursor
Author(s) -
Tianqi Wang,
Abhinav Prakash,
Ellis J. Warner,
Wayne L. Gladfelter,
Bharat Jalan
Publication year - 2015
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4913294
Subject(s) - tin , molecular beam epitaxy , epitaxy , materials science , substrate (aquarium) , sapphire , stoichiometry , analytical chemistry (journal) , flux (metallurgy) , crystal growth , chemical engineering , crystallography , inorganic chemistry , layer (electronics) , nanotechnology , chemistry , metallurgy , organic chemistry , optics , laser , oceanography , physics , engineering , geology