Open AccessAtomic layer deposition of tin oxide and zinc tin oxide using tetraethyltin and ozone
Author(s) -
Ellis J. Warner,
Forrest Johnson,
Stephen A. Campbell,
Wayne L. Gladfelter
Publication year - 2015
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4907562
Subject(s) - tin , atomic layer deposition , amorphous solid , tin oxide , materials science , pulsed laser deposition , analytical chemistry (journal) , stoichiometry , zinc , annealing (glass) , thin film , oxide , nanotechnology , chemistry , metallurgy , crystallography , organic chemistry , chromatography
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