Open AccessConfocal sputtering of conformal α-β phase W films on etched Al features
Author(s) -
John Mark Kreikebaum,
Blas Cabrera,
J. J. Yen,
P. L. Brink,
M. Cherry,
A. Tomada,
Betty Young
Publication year - 2014
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4904422
Subject(s) - materials science , sputtering , fabrication , optoelectronics , focused ion beam , detector , scanning electron microscope , thin film , nanotechnology , optics , ion , composite material , medicine , alternative medicine , physics , pathology , quantum mechanics
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