Open AccessConfocal sputtering of conformal α-β phase W films on etched Al features
Author(s) -
John Mark Kreikebaum,
B. Cabrera,
J. J. Yen,
P. L. Brink,
M. Cherry,
A. Tomada,
B. A. Young
Publication year - 2014
Publication title -
journal of vacuum science and technology. b, nanotechnology and microelectronics
Language(s) - English
Resource type - Journals
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4904422
Subject(s) - materials science , sputtering , fabrication , optoelectronics , detector , focused ion beam , scanning electron microscope , thin film , nanotechnology , optics , ion , composite material , chemistry , medicine , alternative medicine , physics , organic chemistry , pathology