Open AccessThermal chemistry of the Cu-KI5 atomic layer deposition precursor on a copper surface
Author(s) -
Qiang Ma,
Francisco Zaera
Publication year - 2014
Publication title -
journal of vacuum science and technology. a. vacuum, surfaces, and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4896940
Subject(s) - chemistry , copper , disproportionation , desorption , thermal desorption spectroscopy , thermal desorption , x ray photoelectron spectroscopy , adsorption , vinylsilane , alkoxide , inorganic chemistry , crystallography , organic chemistry , catalysis , chemical engineering , engineering