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HfC(310) high brightness sources for advanced imaging applications
Author(s) -
W.A. Mackie,
Josh M. Lovell,
Todd W. Curtis,
Gerald G. Magera
Publication year - 2014
Publication title -
journal of vacuum science and technology b nanotechnology and microelectronics materials processing measurement and phenomena
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.429
H-Index - 119
eISSN - 2166-2754
pISSN - 2166-2746
DOI - 10.1116/1.4862444
Subject(s) - common emitter , scanning electron microscope , brightness , materials science , schottky diode , electron beam induced deposition , optoelectronics , upgrade , cathode ray , optics , electron , scanning transmission electron microscopy , physics , composite material , computer science , diode , quantum mechanics , operating system

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