Open AccessGrowth mode evolution of hafnium oxide by atomic layer deposition
Author(s) -
Xianglong Nie,
Fei Ma,
Dayan Ma,
Kewei Xu
Publication year - 2013
Publication title -
journal of vacuum science and technology a vacuum surfaces and films
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 112
eISSN - 1520-8559
pISSN - 0734-2101
DOI - 10.1116/1.4832224
Subject(s) - atomic layer deposition , transmission electron microscopy , hafnium , materials science , silicon , microstructure , layer (electronics) , deposition (geology) , island growth , high resolution transmission electron microscopy , analytical chemistry (journal) , chemical physics , chemistry , molecular physics , nanotechnology , optoelectronics , metallurgy , geology , epitaxy , zirconium , paleontology , sediment , chromatography
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