Open AccessCharacterization of SOI MEMS Sidewall Roughness
Author(s) -
Leslie M. Phinney,
Bonnie Beth McKenzie,
James Anthony Ohlhausen,
Thomas Edward Buchheit,
R. J. Shul
Publication year - 2011
Publication title -
volume 11: nano and micro materials, devices and systems; microsystems integration
Language(s) - Uncategorized
Resource type - Conference proceedings
DOI - 10.1115/imece2011-62593
Subject(s) - deep reactive ion etching , microelectromechanical systems , materials science , etching (microfabrication) , trench , surface roughness , surface finish , silicon , sputtering , scanning electron microscope , silicon on insulator , optoelectronics , fabrication , reactive ion etching , layer (electronics) , optics , composite material , nanotechnology , thin film , medicine , alternative medicine , physics , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom