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Apremilast‐induced photosensitivity confirmed by photobiological study
Author(s) -
Pita da Veiga Gabriela,
PérezFeal Patricia,
PeñaLópez Sandra,
FernándezRedondo Virginia,
RodríguezGranados María Teresa
Publication year - 2021
Publication title -
photodermatology, photoimmunology and photomedicine
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.736
H-Index - 60
eISSN - 1600-0781
pISSN - 0905-4383
DOI - 10.1111/phpp.12589
Subject(s) - apremilast , photosensitivity , dermatology , medicine , optoelectronics , materials science , psoriasis , psoriatic arthritis
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