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Identification of simple‐sequence‐repeat markers linked to Fusarium wilt ( Fusarium oxysporum f.sp. carthami ) resistance and marker‐assisted selection for wilt resistance in safflower ( Carthamus tinctorius L.) interspecific offsprings
Author(s) -
Anjani Kammili,
Ponukumatla Bhavna,
Mishra Debadutta,
Ravulapalli Durga Prasad
Publication year - 2018
Publication title -
plant breeding
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.583
H-Index - 71
eISSN - 1439-0523
pISSN - 0179-9541
DOI - 10.1111/pbr.12636
Subject(s) - carthamus , fusarium wilt , biology , fusarium oxysporum , marker assisted selection , wilt disease , cultivar , plant disease resistance , horticulture , botany , genetic marker , gene , genetics , medicine , traditional medicine
Abstract Safflower ( Carthamus tinctorius L.) is a multipurpose oilseed crop. Fusarium wilt ( Fusarium oxysporum f.sp. carthami ) is the major damaging disease in safflower. In the present investigation, Fusarium wilt resistance was introgressed from two wild species, Carthamus oxyacantha and Carthamus palaestinus, into susceptible cultivated species through interspecific hybridization. Inheritance of wilt resistance indicated single dominant gene control. Eight simple‐sequence‐repeat (SSR) markers each in (‘Nira’ × C. oxyacantha ) and (‘Nira’ × C. palaestinus ) were found to be linked to wilt resistance. Marker‐assisted selection for wilt resistance was performed using these markers in F 3 –F 7 generations of both crosses. Six wilt resistant interspecific lines evaluated for 2 years under nondisease conditions have recorded 9%–29% higher seed yield than the high yielding cultivar, ‘A1’. The wilt resistant lines would serve as new sources of resistance to wilt in safflower. The SSR markers linked to wilt resistance would be useful for precise selection of wilt resistance at seedling stage in large segregating populations without attempting screening in artificially inoculated conditions and pyramiding of wilt resistant genes from wild into a common background.