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Matrices pattern using FIB; ‘Out‐of‐the‐box’ way of thinking
Author(s) -
FLEGER Y.,
GOTLIBVAINSHTEIN K.,
TALYOSEF Y.
Publication year - 2017
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/jmi.12500
Subject(s) - focused ion beam , nanolithography , materials science , ion beam , high resolution , nanotechnology , resolution (logic) , beam (structure) , computer science , ion , optics , chemistry , physics , artificial intelligence , fabrication , medicine , alternative medicine , remote sensing , organic chemistry , pathology , geology
Summary Focused ion beam (FIB) is an extremely valuable tool in nanopatterning and nanofabrication for potentially high‐resolution patterning, especially when refers to He ion beam microscopy. The work presented here demonstrates an ‘out‐of‐the‐box’ method of writing using FIB, which enables creating very large matrices, up to the beam‐shift limitation, in short times and with high accuracy unachievable by any other writing technique. The new method allows combining different shapes in nanometric dimensions and high resolutions for wide ranges.