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A stand‐alone compact EUV microscope based on gas‐puff target source
Author(s) -
TORRISI ALFIO,
WACHULAK PRZEMYSLAW,
WĘGRZYŃSKI ŁUKASZ,
FOK TOMASZ,
BARTNIK ANDRZEJ,
PARKMAN TOMÁŠ,
VONDROVÁ ŠÁRKA,
TURŇOVÁ JANA,
JANKIEWICZ BARTŁOMIEJ J.,
BARTOSEWICZ BARTOSZ,
FIEDOROWICZ HENRYK
Publication year - 2017
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/jmi.12494
Subject(s) - extreme ultraviolet lithography , microscope , optics , materials science , physics
Summary We report on a very compact desk‐top transmission extreme ultraviolet (EUV) microscope based on a laser‐plasma source with a double stream gas‐puff target, capable of acquiring magnified images of objects with a spatial (half‐pitch) resolution of sub‐50 nm. A multilayer ellipsoidal condenser is used to focus and spectrally narrow the radiation from the plasma, producing a quasi‐monochromatic EUV radiation (λ = 13.8 nm) illuminating the object, whereas a Fresnel zone plate objective forms the image. Design details, development, characterization and optimization of the EUV source and the microscope are described and discussed. Test object and other samples were imaged to demonstrate superior resolution compared to visible light microscopy.