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Epitaxial, electro‐optically active barium titanate thin films on silicon by chemical solution deposition
Author(s) -
Edmondson Bryce I.,
Kwon Sunah,
Lam Chon H.,
Ortmann J. Elliott,
Demkov Alexander A.,
Kim Moon J.,
Ekerdt John G.
Publication year - 2020
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.16815
Subject(s) - thin film , materials science , barium titanate , silicon , epitaxy , crystallinity , optoelectronics , nanotechnology , chemical engineering , composite material , layer (electronics) , dielectric , engineering
Recent progress in the integration of BaTiO 3 thin films with silicon has shown great promise for the development of on‐chip photonic devices. However, the highest performing thin films in the literature are deposited by costly and/or complex vacuum techniques. In this study, epitaxial BaTiO 3 thin films are deposited on thin SrTiO 3 template layers on Si(001) from an alkoxide‐based chemical solution under atmospheric conditions and yield an effective Pockels coefficient of 27 ± 4 pm/V for an ~85 nm film. Film crystallinity, microstructure, and defect nature are examined by X‐ray diffraction and high‐resolution transmission and scanning electron microscopy techniques and discussed within the context of the growth method as well as the observed electro‐optical response.