z-logo
Premium
A Complete Solid Solution with Rutile‐Type Structure in SiO 2 –GeO 2 System at 12 GPa and 1600°C
Author(s) -
Kulik Eleonora,
Nishiyama Norimasa,
Masuno Atsunobu,
Zubavichus Yan,
Murzin Vadim,
Khramov Evgeny,
Yamada Akihiro,
Ohfuji Hiroaki,
Wille HansChristian,
Irifune Tetsuo,
Katsura Tomoo
Publication year - 2015
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.13859
Subject(s) - stishovite , coesite , rutile , materials science , solid solution , decomposition , germanium , lattice constant , silicon , mineralogy , phase transition , thermodynamics , phase (matter) , analytical chemistry (journal) , crystallography , high pressure , chemistry , geology , metallurgy , diffraction , paleontology , physics , tectonics , organic chemistry , optics , chromatography , eclogite , subduction
High pressure and temperature synthesis of compositions made of (Si 1− x ,Ge x )O 2 where x is equal to 0, 0.1, 0.2, 0.5, 0.7, and 1 was performed at 7–12 GPa and 1200–1600°C using a Kawai‐type high‐pressure apparatus. At 12 GPa and 1600°C, all the run products were composed of a single phase with a rutile structure. The lattice constants increase linearly with the germanium content ( x ), which indicates that the rutile‐type phases in the SiO 2 –GeO 2 system form a complete series of solid solutions at these pressure and temperature conditions. Our experimental results show that thermodynamic equilibrium state was achieved in this system at 12 GPa and 1600°C, but not at 1200°C. At lower pressures (7 and 9 GPa) and 1600°C, we observed the decomposition of (Si 0.5 ,Ge 0.5 )O 2 into SiO 2 ‐rich coesite and GeO 2 ‐rich rutile phases. The silicon content in the rutile structure increases sharply with pressure in the vicinity of the coesite–stishovite phase transition pressure in SiO 2 .

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom