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Wide Color Variation in Si NO Thin Films Dispersed with Precipitated TiN Nano Particles
Author(s) -
Sawada Akinori,
Masubuchi Yuji,
Motohashi Teruki,
Kikkawa Shinichi
Publication year - 2014
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.12899
Subject(s) - annealing (glass) , tin , amorphous solid , materials science , thin film , chemical engineering , sputtering , mineralogy , nanotechnology , metallurgy , chemistry , crystallography , engineering
Amorphous thin films of Ti 1− y Si y (N,O) with y ≥ 0.38 were prepared by reactive sputter deposition in a nitrogen atmosphere. Thermal annealing of the films in an ammonia flow above 800°C yielded Si (N,O) amorphous thin films dispersed with precipitated TiN nanosized particles. The film color changed with Si content y and the annealing conditions, from carrot orange to cream yellow in the as‐deposited films due to their oxynitride nature, and from dark green to canary yellow and from iron blue to horizon blue at respective annealing temperatures of 800°C and 900°C due to metallic nature of the TiN nanosized particles precipitated in the annealing.