z-logo
Premium
Oxidation Transitions for SiC Part I. Active‐to‐Passive Transitions
Author(s) -
Jacobson Nathan,
Harder Bryan,
Myers Dwight
Publication year - 2013
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.12108
Subject(s) - suboxide , materials science , stoichiometry , chemical engineering , chemistry , optoelectronics , silicon , engineering
Oxidation of SiC can occur in a passive mode where a protective film is generated or in an active mode where a volatile suboxide is generated and can lead to rapid material consumption. The transition between these two modes of oxidation is a critical issue. Evidence indicates that this transition occurs via a different mechanism for the active‐to‐passive transition as compared with that of the passive‐to‐active transition. In Part I of this article, the former (active‐to‐passive mode) is explored. Three different types of SiC are examined: Si ‐rich SiC , stoichiometric SiC , and C ‐rich SiC . Evidence suggests that the SiO 2 / SiC equilibrium requirements as well as formation of SiO (g) at the SiC surface and subsequent oxidation to SiO 2 (s) are critical issues in the active‐to‐passive transition.

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom