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The Conversion of Perhydropolysilazane into SiON Films Characterized by X‐Ray Photoelectron Spectroscopy
Author(s) -
Wang Kaishi,
Zheng Xiaohao,
Ohuchi Fumio S.,
Bordia Rajendra K.
Publication year - 2012
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.12045
Subject(s) - x ray photoelectron spectroscopy , amorphous solid , silicon oxynitride , annealing (glass) , materials science , silicon , nitrogen , analytical chemistry (journal) , chemical engineering , oxygen , spectroscopy , crystallography , chemistry , silicon nitride , composite material , optoelectronics , organic chemistry , engineering , physics , quantum mechanics
Silicon oxynitride ( SiON ) films of ~1 μm thickness were made by dip coating and subsequent thermal treatment of a preceramic polymer: perhydropolysilazane ( PHPS ). X‐ray photoelectron spectroscopy was used to analyze the surface of a series of SiON films annealed in air between room temperature and 800°C. Results reveal that the progressive changes in the bonding states of silicon, oxygen, and nitrogen due to different degrees of annealing lead to a systematic evolution of atomic ratios of the films. It is shown that PHPS forms a unique amorphous SiO x N y material upon annealing in air up to 800°C with evolving compositions, instead of a mixture of Si 3 N 4 and SiO 2 .