The Conversion of Perhydropolysilazane into   SiON   Films Characterized by X‐Ray Photoelectron Spectroscopy | Zendy

Wang Kaishi | Zendy; Zheng Xiaohao | Zendy; Ohuchi Fumio S. | Zendy; Bordia Rajendra K. | Zendy

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The Conversion of Perhydropolysilazane into SiON Films Characterized by X‐Ray Photoelectron Spectroscopy

Author(s) -

Wang Kaishi,

Zheng Xiaohao,

Ohuchi Fumio S.,

Bordia Rajendra K.

Publication year - 2012

Publication title -

journal of the american ceramic society

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.9

H-Index - 196

eISSN - 1551-2916

pISSN - 0002-7820

DOI - 10.1111/jace.12045

Subject(s) - x ray photoelectron spectroscopy , amorphous solid , silicon oxynitride , annealing (glass) , materials science , silicon , nitrogen , analytical chemistry (journal) , chemical engineering , oxygen , spectroscopy , crystallography , chemistry , silicon nitride , composite material , optoelectronics , organic chemistry , engineering , physics , quantum mechanics

Silicon oxynitride ( SiON ) films of ~1 μm thickness were made by dip coating and subsequent thermal treatment of a preceramic polymer: perhydropolysilazane ( PHPS ). X‐ray photoelectron spectroscopy was used to analyze the surface of a series of SiON films annealed in air between room temperature and 800°C. Results reveal that the progressive changes in the bonding states of silicon, oxygen, and nitrogen due to different degrees of annealing lead to a systematic evolution of atomic ratios of the films. It is shown that PHPS forms a unique amorphous SiO x N y material upon annealing in air up to 800°C with evolving compositions, instead of a mixture of Si 3 N 4 and SiO 2 .

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