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Dip‐Pen Lithography of BiFeO 3 Nanodots
Author(s) -
Jung Inhwa,
Son Jong Yeog
Publication year - 2012
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.12008
Subject(s) - nanodot , materials science , nanolithography , ferroelectricity , nanotechnology , substrate (aquarium) , lithography , optoelectronics , fabrication , dielectric , medicine , oceanography , alternative medicine , pathology , geology
We demonstrate the dip‐pen nanolithography ( DPN ) process of BiFeO 3 nanodots forming a nanodot at any desired position. The BiFeO 3 nanodots exhibited a size increment from 30 to 180 nm for the deposition time between 0.1 and 10 s. This position‐controlled DPN using a silicon nitride cantilever produced an array of the ferroelectric nanodots with a minimum lateral dimension of about 30 nm on a Nb ‐doped SrTiO 3 substrate. We further confirmed canonical ferroelectric responses of the minimum‐sized nanodot using piezoelectric force microscopy.