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Laser Flash Photolysis in a O 3 /Cl 2 Mixture at 266 nm in a Very Low‐Pressure Flow System ¶
Author(s) -
Codnia Jorge,
Manzano Francisco,
Azcárate María Laura
Publication year - 2005
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.2005.tb01446.x
Subject(s) - flash photolysis , photodissociation , chemistry , dissociation (chemistry) , mass spectrometry , analytical chemistry (journal) , radical , laser , ozone , kinetic energy , photochemistry , kinetics , reaction rate constant , optics , chromatography , physics , quantum mechanics , organic chemistry
The laser flash photolysis in a very low‐pressure flow system with mass spectrometry detection technique was developed for the study of oxidation reactions of chlorofluorocarbons. In this work, we have studied the UV photolysis of O 3 in the presence of Cl 2 at room temperature, which presents two catalytic cycles of O 3 depletion with efficiencies dependent on the partial pressures in the photoreactor. The ozone dissociation was initiated with fourth harmonic pulses of a Nd:YAG laser. The detection of the reactants and the final and intermediate reaction products was performed with real‐time mass spectrometry. The variations of the O 3 , Cl 2 and ClO concentration were measured. The equations system associated to a proposed kinetic scheme was solved numerically and excellent agreement with the experimental results was obtained. The results from this work allowed the determination of the wall loss rates of the O( 1 D ), Cl and ClO radicals.