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Preliminary study on photoproduction of hydroxyl radicals in aqueous solution with Aldrich humic acid, algae and Fe(III) under high‐pressure mercury lamp irradiation
Author(s) -
Liu Xianli,
Xu Dong,
Wu Feng,
Liao Zhenhuan,
Liu Jiantong,
Deng Nansheng
Publication year - 2004
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.2004.tb00393.x
Subject(s) - aqueous solution , radical , chemistry , humic acid , mercury (programming language) , algae , benzene , hydroxyl radical , mercury vapor lamp , irradiation , nuclear chemistry , photochemistry , organic chemistry , botany , materials science , optoelectronics , computer science , nuclear physics , biology , programming language , fertilizer , physics
Under a high‐pressure mercury lamp (HPML) and using an exposure time of 4 h, the photoproduction of hydroxyl radicals (*OH) could be induced in an aqueous solution containing humic acid (HA). Hydroxyl radicals were determined by high performance liquid chromatography using benzene as a probe. The results showed that *OH photoproduction increased from 1.80 to 2.74 μ M by increasing the HA concentration from 10 to 40 mg L −1 at an exposure time of 4 h (pH 6.5). Hydroxyl radical photoproduction in aqueous solutions of HA containing algae was greater than that in the aqueous solutions of HA without algae. The photoproduction of *OH in the HA solution with Fe(III) was greater than that of the solution without Fe(III) at pH ranging from 4.0 to 8.0. The photoproduction of *OH in HA solution with algae with or without Fe(III) under a 250 W HPML was greater than that under a 125 W HPML. The photoproduction of *OH in irradiated samples was influenced by the pH. The results showed that HPML exposure for 4 h in the 4‐8 pH range led to the highest *OH photoproduction at pH 4.0.