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Plant Responses to Changing Environmental Stress: Cyclobutyl Pyrimidine Dimer Repair in Soybean Leaves
Author(s) -
Sutherland Betsy M.,
Takayanagi Shinnosuke,
Sullivan Joe H.,
Sutherland John C.
Publication year - 1996
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1996.tb03092.x
Subject(s) - pyrimidine dimer , dimer , photolyase , dna repair , dna damage , dna , chemistry , pyrimidine , horticulture , biology , biophysics , biochemistry , organic chemistry
— We have determined the capacity of soybean seedlings to repair DNA damage by UV doses that do not produce apparent injury in the plants. They remove cyclobutane pyrimidine dimers by both excision and photoreactiva‐tion. The rates and relative contributions of these repair processes were determined as a function of initial level of cyclobutyl pyrimidine dimers. Photoreactivation was detected in seedlings at all initial dimer levels. Although excision was not observed at the lowest dimer frequencies, at higher initial dimer levels it was quite effective in dimer removal. The rates of repair in soybean were substantially higher than in alfalfa seedlings at the same DNA damage levels.