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LETHAL AND MUTAGENIC ACTION OF VACUUM‐AND FAR‐ULTRAVIOLET RADIATIONS ON DRY X174 PHAGE
Author(s) -
Maezawa Hiroshi,
Furusawa Yoshiya,
Suzuki Kenshi
Publication year - 1986
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1986.tb04686.x
Subject(s) - reversion , mutant , ultraviolet radiation , ultraviolet , chemistry , ionization , physics , radiochemistry , optics , biochemistry , ion , gene , phenotype , organic chemistry
Killing and mutation of dry X174 phages (amber mutant) were investigated with vacuum‐UV (130, 150 and 190 nm) and far‐UV (254 nm) radiations. The sensitivity to killing was greatest at 130 nm; the sensitivity (in terms of energy fluence) at 130 nm was about 17 times higher than that at 150 nm. The reversion frequency of amber mutants to pseudo‐wild type at 190 nm was lower than at 254 nm. Comparison of the induction rate of revertants per survivor showed that mutagenicity after 130 nm radiation, which may raise the ionization process, and after X‐rays was similar.