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REPAIR OF UV‐IRRADIATED PLASMID DNA IN EXCISION REPAIR DEFICIENT MUTANTS OF Saccharomyces cerevisiae
Author(s) -
Ikai Kaori,
Tano Keizo,
Ohnishi Takeo,
Nozu Keiichi
Publication year - 1985
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1985.tb01557.x
Subject(s) - plasmid , saccharomyces cerevisiae , mutant , nucleotide excision repair , dna repair , nuclease , dna , microbiology and biotechnology , transformation (genetics) , biology , plasmid preparation , escherichia coli , pyrimidine dimer , micrococcus luteus , yeast , mutation , chemistry , genetics , gene , pbr322
— The repair of UV‐irradiated DNA of plasmid Yep13 was studied in the incision defective strains by measurement of cell transformation frequency. In Saccharomyces cerevisiae, radl,2,3 and 4 mutants could repair UV‐damaged plasmid DNA. In Escherichia coli, uvrA mutant was unable to repair UV‐damaged plasmid DNA; however, pretreatment of the plasmid with Micrococcus luteus endo‐nuclease increased repair. We concluded that all the mutations of yeast were probably limited only to the nuclear DNA.