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TRANSITORY UV RESISTANCE DURING GERMINATION OF UV‐SENSITIVE SPORES PRODUCED BY A MUTANT OF Bacillus cereus 569
Author(s) -
Weinberger Sarah,
Evenchik Zigmund,
Hertman Israel
Publication year - 1984
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1984.tb08858.x
Subject(s) - mutant , bacillus cereus , cereus , spore , pyrimidine dimer , germination , exonuclease , dna , microbiology and biotechnology , endospore , biology , chemistry , dna repair , biochemistry , bacteria , botany , genetics , gene , polymerase
— A mutant of Bacillus cereus 569, isolated by us and designated 2422 is unable to excise cyclobutane‐type dimers and spore‐specific photoproducts from the DNA of UV‐irradiated vegetative cells and dormant spores. The deficiency in the excision repair mechanism was found to be at the post‐incision step in the exonuclease‐mediated removal of the photoproducts. During germination, the mutant B. cereus 2422 exhibits UV‐resistance and an efficient photoproduct removal which is followed by DNA repair synthesis. The data presented indicate the existence of germinative excision repair in B. cereus 569.