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INDUCED REPAIR IN ESCHERICHIA COLI : INDUCTION BY ULTRAVIOLET LIGHT AT‐79°C
Author(s) -
Rader Mildred,
Fluke D. J.,
Pollard Ernest C.
Publication year - 1980
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1980.tb04043.x
Subject(s) - radioresistance , escherichia coli , inducer , dna repair , ultraviolet radiation , radiation , dna , chemistry , ultraviolet , biophysics , biochemistry , biology , genetics , radiochemistry , materials science , physics , optoelectronics , optics , cell culture , gene
— Two of the phenomena associated with induced (S.O.S.) repair, namely induced inhibition of post radiation DNA degradation and induced radioresistance have been shown to be elicited by 245 nm radiation applied to E. coli cells in the frozen state at ‐79°C. The effect of radiation in this condition is considerably less photoreactivable than similar effects produced by exposure in the wet state. Since protein‐DNA crosslinks are believed to be formed under these conditions, such consequences of UV radiation appear to be a potent inducer of induced repair.