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SOLVENT SENSITIVITY OF TYPE II PHOTOREACTIONS OF KETONES AS A DEVICE TO PROBE SOLUTE LOCATION IN MICELLES
Author(s) -
Turro Nicholas J.,
Liu KouChang,
Chow MingFea
Publication year - 1977
Publication title -
photochemistry and photobiology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.818
H-Index - 131
eISSN - 1751-1097
pISSN - 0031-8655
DOI - 10.1111/j.1751-1097.1977.tb07507.x
Subject(s) - micelle , chemistry , solvent , quantum yield , photochemistry , aqueous solution , alkyl , quenching (fluorescence) , ketone , yield (engineering) , cleavage (geology) , solvent effects , organic chemistry , fluorescence , materials science , physics , quantum mechanics , fracture (geology) , metallurgy , composite material
. The solvent sensitivity of the Type II reaction is employed as a device to investigate the properties of detergent solutions. The quantum yield for Type II reaction and the ratio of cleavage to cyclization are used as specific monitors of local solvent properties of micelles. Our results indicate that the average position of phenyl alkyl ketones is either on the micelle surface or in the Stern layer. The absence of significant residence time of the excited ketone in the aqueous phase is confirmed by the lack of quenching of Type II reaction by Eu 3+ in micellar solutions.