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Transparent and Scratch‐Resistant C:ZrO x Coatings on Polymer and Glass by Plasma‐Enhanced Chemical Vapor Deposition
Author(s) -
Mathur Sanjay,
Ruegamer Thomas
Publication year - 2010
Publication title -
international journal of applied ceramic technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.4
H-Index - 57
eISSN - 1744-7402
pISSN - 1546-542X
DOI - 10.1111/j.1744-7402.2010.02537.x
Subject(s) - materials science , x ray photoelectron spectroscopy , amorphous solid , chemical engineering , chemical vapor deposition , crystallization , ellipsometry , polycarbonate , zirconium , substrate (aquarium) , plasma enhanced chemical vapor deposition , thin film , deposition (geology) , combustion chemical vapor deposition , composite material , carbon film , nanotechnology , metallurgy , organic chemistry , chemistry , paleontology , oceanography , sediment , geology , engineering , biology
Transparent and scratch‐resistant zirconium oxide thin films were deposited in radio‐frequency plasma‐enhanced chemical vapor deposition process on glass and polycarbonate substrates using zirconium‐ tetra‐tert ‐butoxide, [Zr(O t Bu) 4 ], as the precursor. Investigations on film morphology (AFM), thickness (cross‐sectional SEM), phase structure (X‐ray diffraction), chemical composition (X‐ray photoelectron spectroscopy), and optical properties (UV/Vis, ellipsometry) revealed the interplay of process parameters (plasma power, gas composition, deposition time, and precursor flux) on the composition and properties of the coatings. High‐quality transparent coatings (>90%) with a tunable refractive index ( n =1.7–2.1) and abrasion‐resistant properties were deposited on both polymer and glass substrates. Despite low deposition temperatures (<100°C), the coatings showed good adherence to the substrate and extraordinary barrier properties that were further improved by depositing intermediary SiO x ‐layers. Phase analysis of the predominantly amorphous films showed the incipient crystallization of ZrO 2 .