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The Model for Oxidation Kinetics of Titanium Nitride Coatings
Author(s) -
Hou Xinmei,
Chou KuoChih,
Zhang Mei
Publication year - 2010
Publication title -
international journal of applied ceramic technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.4
H-Index - 57
eISSN - 1744-7402
pISSN - 1546-542X
DOI - 10.1111/j.1744-7402.2008.02342.x
Subject(s) - tin , titanium nitride , materials science , kinetics , diffusion , oxidation process , titanium , experimental data , process (computing) , nitride , biological system , metallurgy , thermodynamics , chemical engineering , nanotechnology , computer science , layer (electronics) , mathematics , statistics , physics , quantum mechanics , biology , engineering , operating system
The oxidation kinetics of titanium nitride (TiN) film has been studied based on the experimental data summarized in the literature. The analysis shows that the diffusion process is the rate‐controlling step. Based on the experimental data, a new model for predicting the oxidation process is used. In this paper, the effects of factors, such as temperature and heating rate, on the oxidation behavior are discussed not only qualitatively but also quantitatively. The results obtained show that our new model can fit the oxidation data very well. Compared with the previous oxidation studies of TiN coatings, the new model can provide a clear physical meaning of all parameters and therefore it will be useful for a theoretical discussion. The new model can also perform a simple calculation. Most importantly, the new model will lead to a more accurate calculation result; therefore, it can be used to predict the oxidation behavior of TiN materials based on limited experimental information.