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Phototoxicity, photoallergy, and contact sensitization of nitro musk perfume raw materials
Author(s) -
Parker R. D.,
Buehler E. V.,
Newmann A.
Publication year - 1986
Publication title -
contact dermatitis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.524
H-Index - 96
eISSN - 1600-0536
pISSN - 0105-1873
DOI - 10.1111/j.1600-0536.1986.tb01169.x
Subject(s) - phototoxicity , chemistry , ketone , nitro , dermatology , pharmacology , toxicology , organic chemistry , medicine , biochemistry , biology , alkyl , in vitro
The potential of 4 related nitro musk substances (musk tibetene, musk ketone, musk xylol, and musk muskene) to Cause photoallergy. phototaxicity, and, or contact sensitivity was compared to that of musk ambrette: a known photoallergen. Musk ambrette caused u high incidence of photoallergy as indicated by the severity of the skin grades us compared to a control group. Musk tibetene and musk moskene were negative for phototoxicity photoallergenicity and contact sensitivity under the test conditions. Musk xylol was shown to be a weak contact sensitizer. Musk ketone gave challenge responses suggestive of a weak phototoxin and a weak contact sensitizer. The latter was not affected by light exposure. These data suggest that except for musk ambrette, the nitro musks as a group do not have the potential to produce photoallergy. Some members of thss type of perfume raw material could be classified as weak sensitizers (musk xylol, musk ketone) or weakly phototoxic (musk ketone). These latter biological qualities have not been expressed clinically.