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Multi‐Layer Deposition and Characteristics of Nanocrystal CdS Thin Films by an In situ Chemical Reaction Process
Author(s) -
Chu Juan,
Jin Zhengguo,
Yang Jingxia,
Hong Zhanglian
Publication year - 2012
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2012.05314.x
Subject(s) - nanocrystal , thin film , chemical engineering , chemical bath deposition , cadmium sulfide , annealing (glass) , materials science , high resolution transmission electron microscopy , plasma enhanced chemical vapor deposition , chemical vapor deposition , in situ , mineralogy , inorganic chemistry , chemistry , nanotechnology , transmission electron microscopy , organic chemistry , metallurgy , engineering
In this work, an in situ chemical reaction deposition technique using solid cadmium precursor films as reaction source and ammonium sulfide‐based solutions as anionic reaction medium was presented to deposit uniform, crack‐free, densely packed nano‐crystalline, hexagonal wurzite structure Cadmium sulfide ( CdS ) thin films. Influence of the Cd : S molar concentrations in separate cationic and anionic precursor solutions, deposition cycle numbers, and annealing treatment in Ar atmosphere on structure, morphology, film growth, chemical composition, and optical properties of the in situ chemical deposited films are investigated based on XRD , FESEM , AFM , HRTEM , EDS , SAED , and UV –Vis measurements.