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Preparation and Optical Properties of Free‐Standing Transparent Aluminum Nitride Film Assembled by Aligned Nanorods
Author(s) -
Li JiaJie,
Song Bo,
Wu Rong,
Li Jin,
Jian JiKang
Publication year - 2012
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2011.05061.x
Subject(s) - nanorod , materials science , wurtzite crystal structure , nitride , optoelectronics , raman spectroscopy , chemical vapor deposition , aluminium , photoluminescence , ultraviolet , wavelength , raman scattering , nanotechnology , aluminium nitride , optics , composite material , layer (electronics) , zinc , metallurgy , physics
Free‐standing nanostructured Aluminum nitride ( AlN ) film with high transparence in visible light has been prepared by direct reaction of AlCl 3 and NH 3 through a thermal chemical vapor deposition method. The structural and morphological examinations reveal that the film is composed of a large number of well aligned wurtzite‐structured AlN nanorods with growth direction along the c ‐axis. Raman scattering spectrum indicates the high alignment of the AlN nanorods, too. At room temperature, the nanostructured AlN film exhibits a sharp ultraviolet emission at 358 nm and a broad blue emission peak centered at 471 nm, which suggests its potentials in short‐wavelength optoelectronic applications.