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Nanocomposite Ti–Si–N Coatings Deposited by Reactive dc Magnetron Sputtering for Biomedical Applications
Author(s) -
Balasubramanian Subramanian,
Ramadoss Ananthakumar,
Kobayashi Akira,
Muthirulandi Jayachandran
Publication year - 2012
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2011.05029.x
Subject(s) - nanocomposite , materials science , amorphous solid , tin , x ray photoelectron spectroscopy , sputtering , sputter deposition , raman spectroscopy , high resolution transmission electron microscopy , microstructure , chemical engineering , dielectric spectroscopy , composite material , thin film , metallurgy , nanotechnology , electrochemistry , crystallography , transmission electron microscopy , chemistry , physics , optics , electrode , engineering
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar and N 2 gases onto bio implantable 316L stainless steel substrates. X‐ray diffraction analysis revealed that the Ti–Si–N nanocomposite coatings are mainly composed of amorphous Si 3 N 4 and TiN crystals. The presence of different phases like TiN , TiO 2 , and Si 3 N 4 was confirmed from X‐ray photoelectron spectroscopy analysis. Raman spectra of the as‐deposited composite coatings exhibited characteristic peaks at 207.5, 305.8, 442.5, and 571.8 cm −1 . HRTEM indicated columnar microstructure. A higher hardness value of 35 GPa for the nanocomposite coatings was observed. The potentiodynamic polarization and electrochemical impedance spectroscopy measurements showed that the Ti–Si–N nanocomposite coatings exhibited superior corrosion resistance compared with the Si 3 N 4 , TiN single layer, and the bare substrate in simulated body fluid solution.