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In Situ Raman Diagnostic of Structural Relaxation Times of Silica Glasses
Author(s) -
DutreilhColas Maggy,
Canizares Aurélien,
Blin Annie,
Ory Sandra,
Simon Patrick
Publication year - 2011
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2011.04426.x
Subject(s) - annealing (glass) , in situ , raman spectroscopy , raman scattering , materials science , silica glass , relaxation (psychology) , atmospheric temperature range , wavenumber , analytical chemistry (journal) , mineralogy , nuclear magnetic resonance , chemistry , optics , thermodynamics , composite material , physics , chromatography , organic chemistry , psychology , social psychology
High‐purity fused silicas (800–1000 ppm OH) have been studied by in situ Raman scattering in the 1000°–1400°C temperature range, with a particular interest on the behavior under long annealing cycles. We evidence for the first time the relaxation times of silicas in the vicinity of T g by direct monitoring on time–wavenumber 2D representations of the main broad band at 440 cm −1 . These relaxation times appear longer than expected through existing descriptions, and could serve as indicative needed annealing times for thermal treatments and changes of fictive temperature.