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MgTiO 3 (003) Thin Film Deposited on Sapphire (0001) by Sputtering
Author(s) -
Hsiao ChuYun,
Shih ChuanFeng,
Chien ChihHua,
Huang ChengLiang
Publication year - 2011
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2010.04331.x
Subject(s) - sapphire , annealing (glass) , materials science , epitaxy , thin film , spinel , diffraction , sputtering , mineralogy , analytical chemistry (journal) , optics , layer (electronics) , nanotechnology , metallurgy , chemistry , laser , physics , chromatography
This work demonstrates the epitaxy of ilmenite magnesium titanate (MgTiO 3 ) thin films on c ‐plane sapphire. MgTiO 3 thin film with a (003) preferred‐orientation was obtained by adjusting the substrate temperature, annealing temperature, and annealing time; (111)‐preferring spinel Mg 2 TiO 4 was found when magnesium titanate thin films were deposited at room temperature and then postannealed. X‐ray diffraction was used to identify the orientation and quality of the crystal, providing information that is useful in elucidating the epitaxial relationships between the MgTiO 3 /sapphire and Mg 2 TiO 4 /sapphire interfaces. The optical properties of the MgTiO 3 were measured, and (003)‐preferring MgTiO 3 was found to be a good candidate for optical applications.