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Electrophoretic Deposition of Ti 3 Si(Al)C 2 from Aqueous Suspension
Author(s) -
Liang Ying,
Sun Ziqi,
Chen Jixin,
Liu Xiaoxia,
Zhou Yanchun
Publication year - 2010
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2010.03682.x
Subject(s) - electrophoretic deposition , dispersant , microstructure , materials science , scanning electron microscope , deposition (geology) , indium tin oxide , suspension (topology) , aqueous solution , aqueous suspension , chemical engineering , analytical chemistry (journal) , electrophoresis , mineralogy , composite material , layer (electronics) , chemistry , chromatography , optics , dispersion (optics) , coating , organic chemistry , paleontology , sediment , homotopy , pure mathematics , biology , physics , mathematics , engineering
Ti 3 Si(Al)C 2 films were electrophoretically deposited at 3 V on indium‐tin‐oxide (ITO) conductive glass from Ti 3 Si(Al)C 2 aqueous suspension with 1 vol% solid loading at pH 9 in the absence of any dispersant. The surface morphology, cross section microstructure, and preferred orientation of the films were investigated by scanning electron microscopy and X‐ray diffraction. The as‐deposited Ti 3 Si(Al)C 2 films exhibited (00 l ) preferred orientation and the thickness can be controlled by the deposition–drying–deposition method. These results demonstrate that electrophoretic deposition is a simple and feasible method to prepare MAX‐phases green films at room temperature.