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Nanostructuring HfO 2 Thin Films as Antireflection Coatings
Author(s) -
Ni Jie,
Zhu Yu,
Wang Sihong,
Li Zhengcao,
Zhang Zhengjun,
Wei Bingqing
Publication year - 2009
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2009.03306.x
Subject(s) - materials science , refractive index , thin film , optoelectronics , hafnium , silicon , deposition (geology) , optical coating , high refractive index polymer , reflection (computer programming) , porosity , optics , nanotechnology , composite material , zirconium , metallurgy , paleontology , physics , sediment , computer science , biology , programming language
Hafnium dioxide (HfO 2 ) films deposited on silicon substrates can be nanostructured by the glancing angle deposition technique into various porous morphologies, leading to a variation of the refractive index in a range of 1.94–1.16. This makes HfO 2 thin films effective antireflection coatings on many substrates. For example, a 160‐nm‐thick HfO 2 film of an appropriate refractive index can cut more than half the reflection of visible light off the surface of SiC or Al 2 O 3 substrates. This study provides an easy way to design, prepare, and optimize the performance of antireflection coatings on different substrates.