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Chemical Solution Deposition of Transparent and Metallic La 0.5 Sr 0.5 TiO 3+x/2 Films Using Topotactic Reduction
Author(s) -
Zhu Xuebin,
Zhang Shoubao,
Lei Hechang,
Zhu Xiangde,
Li Gang,
Wang Bosen,
Song Wenhai,
Yang Zhaorong,
Dai Jianming,
Sun Yuping,
Shi Dongqi,
Dou Shixue
Publication year - 2009
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2009.02960.x
Subject(s) - materials science , annealing (glass) , metal , electrical resistivity and conductivity , transmittance , chemical bath deposition , analytical chemistry (journal) , deposition (geology) , thin film , perovskite (structure) , chemical vapor deposition , chemical engineering , mineralogy , nanotechnology , optoelectronics , chemistry , metallurgy , paleontology , sediment , biology , chromatography , electrical engineering , engineering
Metallic and transparent La 0.5 Sr 0.5 TiO 3+ x /2 films were prepared by the chemical solution deposition (CSD) method using topotactic reduction processing. The use of Si powder as the reducing agent was facile and allowed easy manipulation. It was observed that metallic (resistivity at 300 K ∼2.43 mΩ cm) and transparent (∼80% transmittance at visible light) La 0.5 Sr 0.5 TiO 3+ x /2 films could be obtained with an annealing temperature of 900°C, which was significantly lower than the hydrogen reduction temperature (∼1400°C). The successful preparation of metallic and transparent La 0.5 Sr 0.5 TiO 3+ x /2 films using CSD has provided a feasible route for depositing other perovskite‐structured functional layers on La 0.5 Sr 0.5 TiO 3+ x /2 films using this low‐cost all CSD method.