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Low‐Temperature Atomic Layer‐Deposited TiO 2 Films with Low Photoactivity
Author(s) -
Liang Xinhua,
King David M.,
Li Peng,
Weimer Alan W.
Publication year - 2009
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2009.02940.x
Subject(s) - atomic layer deposition , anatase , x ray photoelectron spectroscopy , materials science , amorphous solid , chemical engineering , titanium dioxide , titanium , nucleation , scanning electron microscope , deposition (geology) , analytical chemistry (journal) , transmission electron microscopy , layer (electronics) , nanotechnology , photocatalysis , chemistry , crystallography , metallurgy , composite material , catalysis , organic chemistry , paleontology , sediment , engineering , biology
Atomic layer deposition (ALD) has been successfully utilized for the conformal and uniform deposition of ultrathin titanium dioxide (TiO 2 ) films on high‐density polyethylene (HDPE) particles. The deposition was carried out by alternating reactions of titanium tetraisopropoxide and H 2 O 2 (50 wt% in H 2 O) at 77°C in a fluidized bed reactor. X‐ray photoelectron spectroscopy confirmed the deposition of TiO 2 and scanning transmission electron microscopy showed the conformal TiO 2 films deposited on polymer particle surfaces. The TiO 2 ALD process yielded a growth rate of 0.15 nm/cycle at 77°C. The results of inductively coupled plasma atomic emission spectroscopy suggested that there was a nucleation period, which showed the reaction mechanism of TiO 2 ALD on HDPE particles without chemical functional groups. TiO 2 ALD films deposited at such a low temperature had an amorphous structure and showed a much weaker photoactivity intensity than common pigment‐grade anatase TiO 2 particles.