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Decomposition Suppression of Silicon Nitride by Hexagonal Boron Nitride Nanocoatings
Author(s) -
Zhang GuoJun
Publication year - 2009
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2008.02886.x
Subject(s) - materials science , hexagonal boron nitride , decomposition , boron nitride , nitride , silicon nitride , boron , chemical engineering , atmosphere (unit) , thermal decomposition , argon , silicon , hexagonal crystal system , nanotechnology , analytical chemistry (journal) , metallurgy , crystallography , layer (electronics) , chemistry , graphene , organic chemistry , physics , engineering , thermodynamics
We report a stabilized Si 3 N 4 simply with nanocoatings of h‐BN. Very thin BN coatings are enough for suppressing the decomposition of Si 3 N 4 particles. This approach should open up a new potential way to prepare stabilized Si 3 N 4 . Reduced nitridation of H 3 BO 3 ‐coated Si 3 N 4 powder at 1050°C in a flowing mixed 40% N 2 +60% H 2 atmosphere, and then following heat‐treatment at 1500°C in a flowing N 2 atmosphere can realize the nanocoating of BN on Si 3 N 4 particles. Compared with the Si 3 N 4 powder without nanocoatings of h‐BN, TG and XRD analysis showed that the obtained h‐BN nanocoated Si 3 N 4 powder demonstrated obviously improved stability in argon atmosphere.