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Morphology in‐Design Deposition of HfO 2 Thin Films
Author(s) -
Jie Ni,
Yu Zhu,
Qin Zhou,
Zhengjun Zhang
Publication year - 2008
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2008.02654.x
Subject(s) - materials science , nanorod , deposition (geology) , thin film , morphology (biology) , substrate (aquarium) , chemical engineering , transmittance , nanotechnology , optoelectronics , paleontology , oceanography , genetics , sediment , geology , engineering , biology
We investigated factors influencing the growth morphology of hafnium dioxide (HfO 2 ) thin films by glancing angle deposition, and found that a shape factor defined as the ratio of the deposition rate over the substrate rotation speed played a key role in determining the morphology of the films. By adjusting this factor, we fabricated successfully films of aligned HfO 2 nanorods, nanosprings, and nanohelix. Comparing with the flat films, these nanostructured films exhibited enhanced light transmittance and photocatalytic activity in hydrogen production from water splitting under ultraviolet radiation.