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Heavily Nitrogen‐Doped Dual‐Phase Titanium Oxide Thin Films by Reactive Sputtering and Rapid Thermal Annealing
Author(s) -
Li Qi,
Shang Jian Ku
Publication year - 2008
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1551-2916.2008.02608.x
Subject(s) - anatase , materials science , rutile , sputtering , photodegradation , dopant , photocatalysis , crystallization , thin film , visible spectrum , chemical engineering , annealing (glass) , titanium oxide , doping , titanium , band gap , mineralogy , optoelectronics , nanotechnology , composite material , chemistry , metallurgy , organic chemistry , catalysis , engineering
A novel nonequilibrium approach combining low‐temperature reactive sputtering and rapid thermal annealing was developed to resolve the opposing requirements on crystallization and high dopant concentration for creating nitrogen‐doped TiO 2 (TiON) thin film with a mixture of anatase and rutile phases. The dual‐phase TiON has a higher visible‐light absorption and a smaller band gap than pure anatase TiON. Its superior photocatalytic performance was demonstrated by the highly hydrophilic conversion and faster photodegradation of organic pollutants under visible‐light illumination. Our work demonstrates that the crystal structure is a major factor in determining the visible‐light photocatalytic activity of TiON.